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戴忠玲
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Professor Supervisor of Doctorate Candidates Supervisor of Master's Candidates
Paper Publications
[1]左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC模拟研究[J],物理学报,2018,22:340-350
[2]左春彦,高飞,戴忠玲,王友年.高功率微波输出窗内侧击穿动力学的PIC/MCC 模拟研究[J],物理学报,2018,67(22):267-278
[3]戴忠玲,董婉,宋远红,王友年.Effect of ion bombardment time on the profile of atomic layer etching[A],2018
[4]董婉,王喜凤,宋远红,戴忠玲,王友年.Effect of plasma uniformity on etching profiles[A],2018
[5]董婉,戴忠玲,宋远红,王友年.ALE of SiO2 by alternating CF4 plasma with energetic Ar+ plasma beams[A],2018
[6]Ma, Xiaoqin,Zhang, Saiqian,Dai, Zhongling,Wang, Younian.Study on atomic layer etching of Si in inductively coupled Ar/Cl-2 plasmas driven by tailored b...[J],PLASMA SCIENCE & TECHNOLOGY,2017,19(8,SI)
[7]张赛谦,杨雪,戴忠玲,王友年.反应物输运与Ar/C4F8等离子体中SiO2刻蚀的精度控制[A],2017,1
[8]王喜凤,宋远红,戴忠玲,王友年.射频容性耦合SiH4/Ar放电中反转电场及电子能量分布的模拟[A],2017,1
[9]戴忠玲,王友年.Study on atomic layer etching of Si in inductively coupled Ar/Cl2 plasmas driven by tailored bias...[J],Plasma Sci. Technol.,2017,19(6):85502-85502
[10]戴忠玲,王友年.Numerical study of atomic layer precision control for SiO2 etching[A],2017
total58 1/6
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