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Structrual and Electrical Properties of Reactive Magnetron Sputtered Yttrium-doped HfO2 Films

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Date of Publication:2022-10-08

Journal:Chinese Physics B

Affiliation of Author(s):物理学院

Volume:27

Issue:4

Page Number:481031-481036

Pre One:Radial nanofretting behaviors of ultrathin carbon nitride film on silicon substrate

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