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测量真空离子镀和等离子体喷涂镀膜膜厚与均匀性的设备

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First Author:赵栋烨

Disigner of the Invention:Mu Zongxin,Wangqi,hongbin ding

Application Number:CN201720911904.9

Authorization Date:2017-07-26

Authorization number:CN207487604U

Next One:一种低气压大面积、高密度等离子体产生装置及产生方法
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