大连理工大学主页平台管理系统 liufeng--Home-- Optimizing Annealing Process for Ferroelectric Y-Doped HfO2 Thin Films by All-Inorganic Aqueous Precursor Solution

刘峰

Engineer

Gender:Male

Alma Mater:吉林大学

Degree:Doctoral Degree

School/Department:化工海洋与生命学院

Discipline:Polymer Chemistry and Physics

Business Address:D04-110

Contact Information:0427-2631844

E-Mail:liufeng@dlut.edu.cn

Paper Publications

Optimizing Annealing Process for Ferroelectric Y-Doped HfO2 Thin Films by All-Inorganic Aqueous Precursor Solution

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Date of Publication:2022-10-07

Journal:ADVANCED ELECTRONIC MATERIALS

Volume:7

Issue:2

ISSN No.:2199-160X

Key Words:"annealing; chemical solution deposition; ferroelectrics; HfO2; thin films"

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