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Indexed by:期刊论文

Date of Publication:2021-01-11

Journal:MICRO & NANO LETTERS

Volume:9

Issue:2

Page Number:136-140

ISSN No.:1750-0443

Key Words:electrical resistivity; electrohydrodynamics; photolithography; photoresists; suspensions; thin films; graphene; graphene microscale structure patterning; electrohydrodynamic deposition; photoresist moulds; graphene suspension; graphene thin films; atomisation-substrate distance; sheet resistances; deposition distance; sharp-angled heave surface behaviour; electrohydrodynamic atomisation; photolithography polymeric micromoulding technique; graphene structures; photoresist micromould; C

Abstract:In this reported work, a graphene suspension was atomised and deposited using the electrohydrodynamic atomisation technique, enabling the formation of a wide range of graphene thin films. The influences of the atomisation-substrate distance on the characteristics of the graphene films and their sheet resistances were analysed. A distance of 3 mm was found to be the optimum deposition distance for this graphene suspension to produce an even film and a low sheet resistance. At a lower and a higher working distance the graphene films exhibited a sharp-angled heave surface behaviour and a high sheet resistance. In addition, electrohydrodynamic atomisation combined with a photolithography polymeric micromoulding technique was used to form graphene structures. After removing the photoresist micromould, the graphene structures remained under well-arranged characteristics. After two layers of electrohydrodynamic atomisation deposition at a working distance of 3 mm, the thickness of the film was approximate to 400 nm and exhibited a sheet resistance of 127.5 sq(-1) (ohms per square).