Indexed by:会议论文
Date of Publication:2008-01-01
Included Journals:EI、CPCI-S、SCIE
Volume:373-374
Page Number:497-+
Key Words:ion implantation; scratch; residual stress; micro-Raman Spectroscopy
Abstract:Surface modification mechanism on scratch of ion implanted p-Si (100) is investigated by scanning electric microscopy and micro-Raman spectroscopy. Raman experimental results reveal that the amorphous Si appears near the scratch during the scratching process, while the ion implantation adjusts the structural parameters of the amorphous Si and changes the residual stress state of the surface scratch from tension to compression. Moreover, Raman experimental results reveal that the laser power synchronously decreases Raman shift and full width of half maximum intensity (FWHM). The laser heating effect can be neglected because a lower laser power is selected in our measurements.
Professor
Supervisor of Doctorate Candidates
Supervisor of Master's Candidates
Gender:Male
Alma Mater:Dalian University of Technology (DUT)
Degree:Doctoral Degree
School/Department:State Key Laboratory of Industrial Equipment for Structral Analysis, Department of Engineering Mechanics
Discipline:Solid Mechanics. Applied and Experimental Mechanics. Engineering Mechanics. Mechanical Manufacture and Automation. Vehicle Engineering. Aerospace Mechanics and Engineering. mechanics of manufacturing process
Business Address:Room 321, Department of Engineering Mechanics
Contact Information:Tel.: 86 0411-84708406 Email: leizk@dlut.edu.cn
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