赵书霞

基本信息Personal Information

副教授 硕士生导师

性别 : 女

出生年月 : 1980-08-07

毕业院校 : 大连理工大学

学位 : 博士

在职信息 : 在职

所在单位 : 物理与光电工程学院

学科 : 等离子体物理

办公地点 : 新三束实验室3号楼 201室

联系方式 : 0411-84709795-21

Email :

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个人简介Personal Profile

赵书霞,女,河北省临漳县人,副教授,硕士生导师,主要从事低温等离子体源和微电子处理工艺的数值模拟研究,模拟方法包括流体模拟、粒子模拟、混合模拟以及整体模拟,先后采用这些方法模拟过氮气平板和空心阴极直流辉光的放电特性、射频感性耦合等离子体的模式转换机理、碳氟性等离子体的放电特性和刻蚀机理、以及背景气体输运和等离子体的耦合机制等。完成国家青年自然科学基金一项和企业项目研发横向合同一项。截止目前共发表相关学术论文23篇,其中SCI和EI均收录的国际刊源文章共18篇,一作文章8篇,本人为通讯作者文章6篇,在参与发表的论文里都做出了实质性的贡献。目前教授本科生必修课程《数学物理方法》和双语课程《科技文献阅读与写作》,并担任四名本科生的指导导师。在研硕士生3名,毕业1名。

论文发表详细情况:
[1]Shu-Xia Zhao, Fei Gao, Ya-Ping Wang, You-Nian Wang and Annemie Bogaerts, "Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma", J. Appl. Phys., 118(3), 033301 (2015)

[2]Shu-Xia Zhao, Yu-Ru Zhang, Fei Gao, You-Nian Wang and Annemie Bogaerts, "Bulk plasma fragmentation in C4F8 inductively coupled plasma: a hybrid modeling study", J. Appl. Phys., 117(24), 243303 (2015)

[3]Shu-Xia Zhao, Fei Gao, You-Nian Wang and Annemie Bogaerts, "Gas ratio effects on the Si etch rate and profile uniformity in an Ar/CF4 inductively coupled plasma", Plasma Sources Sci. Technol. 22, 015017 (2013)
 
[4]Shu-Xia Zhao, Fei Gao, You-Nian Wang and Annemie Bogaerts, "The effects of F2 attachment by low-energy electrons on the electron behavior in an Ar/CF4 inductively coupled plasma", Plasma Sources Sci. Technol. 21, 025008 (2012).
 
[5]Shu-Xia Zhao, and You-Nian Wang, "Investigation of the effect of metastable atoms on mode transition in argon inductive discharge via a hybrid model ", J. Phys. D: Appl. Phys. 43, 275203 (2010).

[6]Shu-Xia Zhao, Fei Gao and You-Nian Wang, "Dynamic investigation of mode transition in inductively coupled plasma with a hybrid model", J. Phys. D: Appl. Phys. 42, 225203 (2009).

[7]Shu-Xia Zhao, Xiang Xu, Xue-Chun Li and You-Nian Wang, "Fluid simulation of the E-H mode transition in inductively coupled plasma", J. Appl. Phys. 105, 083306 (2009)

[8]赵书霞,张连珠,“氮气辉光放电等离子体过程的PIC/MCC模拟”,核聚变与等离子体物理,29, 39-43 (2009)

[9]Hui-Jing Xu,Shu-Xia Zhao, Yu-Ru Zhang, Fei Gao, Xue-Chun Li, You-Nian Wang, "Equivalent circuit effects on mode transitions in H2 inductively coupled plasmas",Phys. Plasma, 22, 043508, (2015)

[10]Hui-Jing Xu, Shu-Xia Zhao, Fei Gao, Yu-Ru Zhang, Xue-Chun Li, You-Nian Wang, "Discontinuity of mode transition and hysteresis in hydrogen inductively coupled plasma via a fluid model", Chin. Phys. B, 24(11), 115201,(2015)

[11]Wei Liu, Fei Gao, Shu-Xia Zhao, Xue-Chun Li, and You-Nian Wang, "Mode transitioin in CF4+Ar inductively coupled plasma", Phys. Plasmas, 20, 123513 (2013)

[12]Lian-Zhu Zhang, Shu-Xia Zhao, Xiu-Lan Meng, “Characterization of nitrogen glow discharge plasma via optical emission spectrum simulation”, Plasma Sci. and Tech., 10, 455 (2008)

[13]Fei Gao, Shu-Xia Zhao, Xiao-Song Li and You-Nian Wang, "Effects of matching network on the hysteresis during E and H mode transitions in argon inductively coupled plasma ", Phys. Plasmas 17, 103507 (2010).

[14]Fei Gao, Shu-Xia Zhao and You-Nian Wang, "Comparison between experiment and simulation for Ar inductively coupled plasma", Phys. Plasmas 16, 113502, (2009).

[15]Xue-Jiao Si, Shu-Xia Zhao, Xiang Xu, Annemie Bogaerts and You-Nian Wang, "Fluid simulations of frequency effects on nonlinear harmonics in inductively coupled plasma", Phys. Plasmas, 18, 033504 (2011)

[16]Wei Yang, Shu-Xia Zhao, De-Qi Wen, Wei Liu, Yong-Xin Liu, Xue-Chun Li, and You-Nian Wang, "F-atoms kinetics in SF6/Ar inductively coupled plasma", J. Vac. Sci. Technol. A, 34(3), 031305 (2016)

[17]Wei, Liu, De-Qi Wen, Shu-Xia Zhao, Fei Gao, and You-Nian Wang, "Characterization of O2 /Ar inductively coupled plasma studied by using a Langmuir probe and global model', Plasma Sources Sci. Technol. 24, 025035 (2015)

[18]Xi-Feng Wang, Yuan-Hong Song, Shu-Xia Zhao, Zhong-Ling Dai, and You-Nian Wang, "Hybrid Simulation of Duty Cycle Influences on Pulse Modulated RF SiH4/Ar Discharge", Plasma Sci. Technol., 18(1), 1 (2016)

[19]Yu-Ru Zhang, Xiang Xu, Shu-Xia Zhao, Annemie Bogaerts, and You-Nian Wang, "Comparison of electrostatic and electromagnetic simulations for very high frequency plasma", Phys. Plasmas, 17, 113512 (2010)

[20]Quan-Zhi Zhang, Shu-Xia Zhao, Wei Jiang, and You-Nian Wang, "Separate control between geometrical and electrical asymmetry effects in capacitively coupled plasmas", J. Phys. D: Appl. Phys., 45, 305203 (2012)

[21]Wei Jiang, Hong-Yu Wang, Shu-Xia Zhao, and You-Nian Wang, "Hysteresis induced by gap length effects in CCP at low pressure", J. Phys. D: Appl. Phys., 42, 102005 (2009)

[22]Liang Yang, Hui-Jie Yan, Xiao-Hua Qi, Shu-Xia Zhao, and Chun-Sheng Ren, "Geometry Effects of SDBD Actuator on Atmospheric-Pressure Discharge Plasma Airflow Acceleration", IEEE Trans. Plasma Sci., 43(10), 3653 (2015)

[23]Fei Gao, Xue-Chun Li, Shu-Xia Zhao, and You-Nian Wang, "Spatial variation behaviors of argon inductively coupled plasma during discharge mode transition", Chin. Phys. B, 21(7), 075203 (2012)

  • 教育经历Education Background
  • 工作经历Work Experience
    2010.8 2012.12
    • 比利时安特卫普大学
  • 研究方向Research Focus
  • 社会兼职Social Affiliations
  • 流体力学的有限差分和有限体积数值模拟技术
  • 具有自主知识产权的大型源代码的编写和调试
  • COMSOL多物理场耦合和PEGSUS低温等离子体模拟商业软件的使用
  • 低气压射频等离子体源背景气体和中性基团的输运机制
  • 低气压射频容性和感性耦合放电的流体动力学模型研究
  • 碳氟等离子体源的放电特性和硅材料的刻蚀机理
  • 射频感性耦合等离子体放电模式转化机理的混合模拟研究
  • 氮气直流平板和空心阴极辉光放电特性的PIC/MCC模拟研究
  • 低温等离子体源的多物理场数值仿真技术