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Indexed by:期刊论文

Date of Publication:2012-06-01

Journal:MATERIALS EXPRESS

Included Journals:SCIE、Scopus

Volume:2

Issue:2

Page Number:157-163

ISSN No.:2158-5849

Key Words:Silicon Oxide; CVD; Ferric Chloride; Nanowires Assembly; VLS

Abstract:Silicon oxide (SiOx) nanowire assemblies have been synthesized using anhydrous ferric chloride (FeCl3) as a catalyst precursor and silicon wafers as both the silicon source and substrate by means of floating catalyst chemical vapor deposition (CVD) in order to produce different morphologies. It is found that the growth and morphology of SiOx is strongly temperature-dependent, as tested within the temperature range 1000-1200 degrees C. The sublimation of FeCl3 and its subsequent reduction in the gas phase to produce Fe nanoparticles with high catalytic activity allows for the efficient growth of SiOx nanowires via vapor liquid solid (VLS) mechanism. The prepared amorphous SiOx nanowires show photoluminescence and emit blue light. This floating catalyst method offers a simple and comprehensive approach for the large-scale production of SiOx nanostructures with tunable assemblies.