商克峰

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:电气工程学院

学科:电工理论与新技术. 环境工程

办公地点:Institute of Electrostatics and Special Power

联系方式:shangkf@dlut.edu.cn

电子邮箱:shangkf@dlut.edu.cn

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DC discharge with high secondary electron emission oxide cathode: Effects of gas pressure and oxide cathode structure

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论文类型:期刊论文

发表时间:2019-08-01

发表刊物:VACUUM

收录刊物:SCIE、EI

卷号:166

页面范围:114-122

ISSN号:0042-207X

关键字:DC discharge; Oxide cathode; Secondary electron emission; Gas pressure; Oxide layer structure

摘要:In present study, DC discharge with high secondary electron emission (SEE) oxide cathodes (NiO/Ni and MgO/NiO/Ni cathode) is characterized with a significant increase in discharge current compared to the one with normal Ni cathode at different gas pressures from 400 to 700 torr. The increase multiple value of the discharge current decreases as the gas pressure increases, which can be related to a relative weakened ion-induced SEE process at high gas pressure. The NiO intermediate layer plays an important role in a sandwich MgO/NiO/Ni cathode for DC discharge, which may be due to the fact that its high resistance favors field-enhanced SEE process. Regardless of the gas pressure, the structural characteristics (thickness and roughness) of oxide layer have an effect on the enhancement of the discharge current, which can be attributed to field-enhanced SEE process. Additionally, the increase in the number of needle electrodes is conducive to the increase of discharge current with oxide cathode, which is related to an increase in the discharge area on the cathode surface according to the discharge images.