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    王立达

    • 副教授       硕士生导师
    • 性别:男
    • 毕业院校:大连理工大学
    • 学位:博士
    • 所在单位:化工学院
    • 学科:化学工程
    • 办公地点:大连理工大学西部校区化工综合楼A506
    • 电子邮箱:ldwang@dlut.edu.cn

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    Corrosion inhibitor embedded spherical micro-pits fabricated using cetyltrimethyl ammonium bromide as etching template for self-healing corrosion protection

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    论文类型:期刊论文

    第一作者:Zhang, Kaiyue

    通讯作者:Liu, GC (reprint author), Dalian Univ Technol, Sch Chem Engn, Dept Mat Sci & Chem Engn, 2 Linggong Rd, Dalian 116024, Peoples R China.

    合写作者:Wang, Lida,Sun, Wen,Liu, Guichang

    发表时间:2014-11-01

    发表刊物:CORROSION SCIENCE

    收录刊物:SCIE、EI

    卷号:88

    页面范围:444-451

    ISSN号:0010-938X

    关键字:Copper; SEM; EIS; Passive film

    摘要:In this study, a self-healing system is composed of spherical micro-pits layer storing inhibitor and epoxy layer for physical shielding. The spherical micro-pits were fabricated in a copper substrate via HNO3 etching technique with the assistance of cetyltrimethyl ammonium bromide (CTAB) and ultrasonication. By means of localized electrochemical measurements, significant inhibition of corrosion activity can be observed in the scratched area. After being scratched, the self-healing system rapidly releases the inhibitor embedded in the spherical micro-pits to resist the corrosion process. The exposed copper is covered with an inhibitor adsorption film and protected effectively. (C) 2014 Published by Elsevier Ltd.