大连理工大学主页平台管理系统 YongXin Liu--yxliu--Scientific Research

YongXin Liu

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Zhao, Kai.Experimental investigation of standing wave effect in dual-frequency capacitively coupled argon discharges: role of a low-frequency source[J],PLASMA SOURCES SCIENCE & TECHNOLOGY,2021,27(5)

赵凯.Suppression of nonlinear standing wave excitation via the electrical asymmetry effect[J],Plasma Sources Sci. Technol,2021,29:124001-

Sun, Jing-Yu,Wen, De-Qi,Zhang, Quan-Zhi,Liu, Yong-Xin,Wang, You-Nian.The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials[J],PHYSICS OF PLASMAS,2019,26(6)

Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Wang, Xiang-Yu,Li, Ang,Xu, Jun,Jing, Zhen-Guo,Wang, You-Nian.Observation of the standing wave effect in large-area, very-high-frequency capacitively coupled plasmas by using a fiber Bragg grating sensor[J],JOURNAL OF APPLIED PHYSICS,2018,123(22)

Han, Dao-Man,Liu, Yong-Xin,Gao, Fei,Liu, Wen-Yao,Xu, Jun,Wang, You-Nian.Measurements of argon metastable density using the tunable diode laser absorption spectroscopy in Ar and Ar/O-2[J],CHINESE PHYSICS B,2018,27(6)

Xue, Chan,Gao, Fei,Liu, Yong-Xin,Liu, Jia,Wang, You-Nian.Phase shift effects of radio-frequency bias on ion energy distribution in continuous wave and pulse modulated inductively coupled plasmas[J],CHINESE PHYSICS B,2018,27(4)

一种磁探针装置

一种用于实验教学的尘埃晶格观察和分析装置

一种用于测定等离子体中微量粒子浓度的吸收光谱装置

Published Books

近代物理实验（第二版）

Research Projects More>>

低气压射频容性耦合等离子体物理, 国家自然科学基金项目, 2017/08/17, 结题

脉冲调制甚高频大面积容性放电中的电磁效应研究, 其他课题, 2015/07/03-2016/12/28, 结题

脉冲调制容性耦合等离子体的物理特性研究, 国务院其他部门, 2014/09/01-2016/12/28, 结题

低气压脉冲调制容性耦合等离子体特性研究, 国家自然科学基金项目, 2014/09/01-2017/12/31, 结题

CFETRN-NBI负离子源仿真优化设计及实验评估, 国家科技部, 2017/07/01, 在研

高功率微波窗击穿诊断研究, 其他课题, 2018/01/29-2021/01/19, 结题

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Gender:Male

Alma Mater:大连理工大学

Degree:Doctoral Degree

School/Department:物理学院

Discipline:Plasma physics

Business Address:大连理工大学三束材料改性教育部重点实验室3号楼201室

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Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024