Indexed by:期刊论文
Date of Publication:2011-05-01
Journal:物理化学学报
Included Journals:SCIE、PKU、ISTIC、CSCD
Volume:27
Issue:5
Page Number:1116-1121
ISSN No.:1000-6818
Key Words:聚吡咯;过氧化;氧化还原稳定性;连续电位阶跃
Abstract:连续电位阶跃方法是一种研究氧化还原稳定性的有效方法.本文采用连续电位阶跃方法研究了以对甲苯磺酸钠为掺杂剂的聚吡咯(ppy)膜的电化学氧化还原稳定性,通过计算聚吡咯在阶跃电位下的还原电量(Qred),还原和氧化电量的比值(Qred/Qox)考察聚吡咯在H2SO4、Na2SO4和NaOH溶液中在不同电位下的氧化还原可逆性.结果发现聚吡咯过氧化的发生强烈依赖支持电解质的pH值和阶跃电位.在H2SO4溶液中,过氧化的起始电位为0.8 V,而在Na2SO4溶液中.过氧化的起始电位为0.5V.在NaOH溶液中,过氧化在任何电位均可发生,表明溶液中OH-的存在是过氧化发生的直接原因.
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Supervisor of Doctorate Candidates
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Gender:Male
Alma Mater:大连工学院
Degree:Master's Degree
School/Department:环境学院
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