location: Current position: Home >> Scientific Research >> Paper Publications

AF/PSTM and its application in nanometer material measurement

Hits:

Indexed by:会议论文

Date of Publication:2005-06-09

Included Journals:EI、CPCI-S

Volume:121-123

Issue:PART 2

Page Number:859-862

Key Words:nanometer material measurement; nanotechnology; SNOM

Abstract:Atomic force and photon scanning tunneling combined microscope (AF/PSTM) is a novel scanning near-field optical microscope (SNOM) made in our lab, which works in equi-amplitude tapping mode. It can obtain sample's topography image and optical image simultaneously. This paper introduces the principle of AF/PSTM, and then provides its artifact elimination principle and related experiment results, which illustrates not only the function of artifact elimination, but also that the refraction index variation was not affected by the incident optical intensity. Two main factors in imaging are analysed, and relative experiment results are provided. The optical image and the topography image of nanometer oil additive with this AF/PSTM reveal the real information of sample, which proves the validity of AF/PSTM in nanometer material measurement.

Pre One:Fabrication of a brush-shaped bent fiber probe for near-field optics by heated pulling combined with chemical etching

Next One:探针尖带金属微粒的光子扫描隧道显微镜成像数值模拟