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论文类型：期刊论文

发表时间：2015-12-01

发表刊物：JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY

收录刊物：SCIE、EI、ISTIC、CSCD、Scopus

卷号：31

期号：12

页面范围：1198-1206

ISSN号：1005-0302

关键字：Nanocrystalline; Cl- adsorption; XPS (X-ray photoelectron spectroscopy); First principles calculations

摘要：The adsorption and diffusion behavior of Cl- on sputtering Fe-20Cr nanocrystalline (NC) thin film compared with corresponding coarse crystalline (CC) alloy has been studied in HCl + NaCl solution (pH = 2, [Cl-]= 0.1 mol/L) by electrochemical techniques, X-ray photoelectron spectroscopy (XPS) and the first-principles calculations. The XPS results show that adsorption and diffusion of Cl- in the passive film has been inhibited on NC thin film. Ultra-violet photoelectron spectroscopy (UPS) results show that the work function Phi(s) of NC thin film (4.7 eV) is higher than that of CC alloy (4.5 eV). The theoretical calculations and valence electron structure analysis were used to understand the effect of nanocrystallization in this work. Copyright (C) 2015, The editorial office of Journal of Materials Science & Technology. Published by Elsevier Limited. All rights reserved.