个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:大连理工大学
学位:博士
所在单位:化工学院
学科:化学工程. 水科学与技术
办公地点:西部校区化工综合楼A503
联系方式:gchliu@dlut.edu.cn
电子邮箱:gchliu@dlut.edu.cn
Study on the thermal conductivity of diamond-like carbon functionally graded material on copper substrate
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论文类型:期刊论文
发表时间:2012-03-01
发表刊物:ACTA PHYSICA SINICA
收录刊物:SCIE、PKU、ISTIC、Scopus
卷号:61
期号:5
ISSN号:1000-3290
关键字:copper substrate; diamond-like carbon; graded intermediate layer; thermal conductivity
摘要:In recent years, with the rapid development of electronic technology and digital network information, copper has increasing applications in micro-electronics, micro-electro-mechanical systems and Hi-tech materials. However copper has its material limitations. In particular, it has relatively low hardness, high oxidation and wear rate, which have severely restricted its widespread applications. In this paper, aiming at difficulties of copper applications, Ti/TiC/DLC has been proposed as functionally graded material to deposit on the copper substrate with plasma depositing method, which intensifies the adhesion between DLC film and copper substrate and improves the properties of copper. The maximal value of thermal conductivity of DLC film with optimized parameter of graded intermediate layer is 3.63 Wm(-1).K-1, which enhances the heat transfer effect of copper substrate.