刘贵昌

个人信息Personal Information

教授

博士生导师

硕士生导师

性别:男

毕业院校:大连理工大学

学位:博士

所在单位:化工学院

学科:化学工程. 水科学与技术

办公地点:西部校区化工综合楼A503

联系方式:gchliu@dlut.edu.cn

电子邮箱:gchliu@dlut.edu.cn

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Effects of supporting electrolyte on galvanic deposition of Cu2O crystals

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论文类型:期刊论文

发表时间:2011-07-15

发表刊物:ELECTROCHIMICA ACTA

收录刊物:Scopus、SCIE、EI

卷号:56

期号:18

页面范围:6277-6283

ISSN号:0013-4686

关键字:Galvanic deposition; Supporting electrolyte; Cu2O; Octahedral

摘要:The effects of introduced supporting electrolyte on the galvanic deposition of Cu2O crystals have been investigated using scanning electron microscopy (SEM), energy-dispersive X-ray (EDX), X-ray diffraction (XRD). The results show that the chemical nature of supporting electrolytes plays very important roles in the galvanic deposition of Cu2O crystals. The chloride stabilizes the (1 0 0) planes of Cu2O crystals, resulting in the formation of cubic crystals, while nitrate, sulfate and fluoride stabilize the (1 1 1) planes of Cu2O crystals, leading to the deposition of truncated octahedral and octahedral Cu2O crystals. It provides a facile way to control the morphology of galvanically obtained Cu2O crystals by indirectly adjusting the inorganic adsorption agents. (C) 2011 Elsevier Ltd. All rights reserved.