Current position: Home >> Scientific Research >> Paper Publications

A Method to Improve Uniformity of Material Removal of Chemical Mechanical Polishing in LCOS Process

Release Time:2019-03-12  Hits:

Indexed by: Journal Article

Date of Publication: 2008-01-01

Journal: Key Engineering Materials

Volume: 364

Issue: 366

Page Number: 686-689

Prev One:Research of a Novel Polishing Plate Material for the CVD Diamond Film Polishing

Next One:Theoretical analysis and experimental verification of triangular fracture defects of MgO single crystal substrate in lapping or polishing process
Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click:Times MOBILE Version
The Founding Time : ..
The Last Update Time : ..

Browse on mobile