Current position: Home >> Scientific Research >> Patents

一种离子推进器碳栅组件制孔方法

Hits:

First Author:Haibo Liu

Disigner of the Invention:王晋宇,韩灵生,仲小清,甘涌泉,Kuo Liu,Wang Yongqing,Dongming Guo

Application Number:CN201811029370.2

Authorization Date:2018-09-05

Authorization number:CN109227740A

Pre One:存在微结构的基底表面薄膜上表面平整化装置与方法

Next One:一种用于小型复杂曲面零件的浮动抛光装置及方法