个人信息Personal Information
教授
博士生导师
硕士生导师
性别:男
毕业院校:复旦大学
学位:博士
所在单位:物理学院
学科:凝聚态物理
办公地点:大连理工大学三束材料改性重点实验室1号楼203房间
联系方式:qyzhang@dlut.edu.cn 0411-84707930 转 13
电子邮箱:qyzhang@dlut.edu.cn
Improvement of electrical-resistivity model for polycrystalline films of metals with non-spherical Fermi surface: A case for Os films
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论文类型:期刊论文
发表时间:2017-04-07
发表刊物:JOURNAL OF APPLIED PHYSICS
收录刊物:SCIE、EI
卷号:121
期号:13
ISSN号:0021-8979
摘要:Osmium (Os) is a hexagonal-close-packed metal with a non-spherical Fermi surface that seriously deviates from the assumption in the Mayadas-Shatzkes electrical-resistivity model (MS model) for the size effects of polycrystalline films of metals due to electron scattering by grain boundaries. In this work, we studied the resistivity of the Os films with different thicknesses as a function of temperature in the range of 20 to 296 K. The electron scattering by the surface was found to be unimportant in the contributions to the size effects of resistivity of Os films with a sufficient thickness. Based on the first-principles calculations, an analytical equation was suggested for correction to the MS model and used for fitting the temperature-dependent resistivity of the Os films. The results show that correction to the MS model is necessary and the residual resistivity caused by the defects and impurities cannot be neglected. In addition, the inhomogeneity of resistivity in the direction perpendicular to the film surface was discussed under an assumption of parallel circuits. Published by AIP Publishing.