location: Current position: Home >> Scientific Research >> Paper Publications

EFFECT OF APPLIED PULSE BIAS ON SHEATH CHARACTERISTICS IN PLASMA SOURCE ION IMPLANTATION WITH DIELECTRIC SUBSTRATES

Hits:

Indexed by:会议论文

Date of Publication:2011-01-01

Pre One:Simulation of a pulse-modulated radio-frequency atmospheric pressure pulse-modulated radio-frequency atmospheric pressure

Next One:Sheath dynamics in a cylindrical PET-film for plasma immersion ion implantation