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Indexed by:期刊论文

Date of Publication:2014-04-01

Journal:PLASMA SCIENCE & TECHNOLOGY

Included Journals:SCIE、EI

Volume:16

Issue:4

Page Number:320-323

ISSN No.:1009-0630

Key Words:capacitively coupled plasma; sheath; fluid; two dimension; LF power

Abstract:A self-consistent two-dimensional (2D) collisionless fluid model is developed to simulate the effects of the low-frequency (LF) power on a dual frequency (DF) capacitive sheath over an electrode with a cylindrical hole. In this paper, the time-averaged potential, electric field (E-field), ion density in the sheath, and ion energy distributions (IEDs) at the center of the cylindrical hole's bottom are calculated and compared for different LF powers. The results show that the LF power is crucial for determining the sheath structure. As the LF power decreases, the potential drop decreases, the sheath becomes thinner, and the plasma molding effect seems to be more significant. The existence of a radial E-field near the sidewalls of a hole may cause a significant portion of ions to strike the sidewall and lead to the phenomenon of notching.