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Indexed by:期刊论文

Date of Publication:2005-06-30

Journal:半导体光电

Included Journals:PKU、ISTIC、CSCD、Scopus

Volume:26

Issue:3

Page Number:212-215

ISSN No.:1001-5868

Key Words:中频磁控溅射;掺铒Al2O3薄膜;镱铒共掺Al2O3薄膜;光致发光特性

Abstract:用中频磁控溅射工艺分别制备了掺铒Al2O3薄膜和镱铒共掺Al2O3薄膜,室温下测量了它们的光致发光特性.结果表明:镱铒共掺Al2O3薄膜光致发光的峰值强度为掺铒Al2O3薄膜的8倍以上, 两者的半值宽度近似相等;泵浦功率增强,掺铒 Al2O3薄膜光致发光强度出现饱和趋势,但镱铒共掺Al2O3薄膜的光致发光强度随泵浦功率线性增加.