Release Time:2019-03-10  Hits:

Indexed by: Journal Article

Date of Publication: 2005-06-30

Journal: 半导体光电

Included Journals: Scopus、CSCD、ISTIC、PKU

Volume: 26

Issue: 3

Page Number: 212-215

ISSN: 1001-5868

Key Words: 中频磁控溅射;掺铒Al2O3薄膜;镱铒共掺Al2O3薄膜;光致发光特性

Abstract: 用中频磁控溅射工艺分别制备了掺铒Al2O3薄膜和镱铒共掺Al2O3薄膜,室温下测量了它们的光致发光特性.结果表明:镱铒共掺Al2O3薄膜光致发光的峰值强度为掺铒Al2O3薄膜的8倍以上, 两者的半值宽度近似相等;泵浦功率增强,掺铒 Al2O3薄膜光致发光强度出现饱和趋势,但镱铒共掺Al2O3薄膜的光致发光强度随泵浦功率线性增加.