Current position: Home >> Scientific Research >> Patents

掺杂氧化镓膜的制备方法及掺杂氧化镓膜

Release Time:2019-03-09  Hits:

First Author: 夏晓川

Disigner of the Invention: 胡礼中,梁红伟,柳阳,申人升

Authorization Number: ZL.201310398997.6

Prev One:一种半导体电极欧姆接触电阻参数提取方法

Next One:在镓系异质半导体衬底上制备氧化镓膜的方法及氧化镓膜