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A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

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Date of Publication:2025-10-24

Journal:JOURNAL OF PHYSICS D-APPLIED PHYSICS

Volume:58

Issue:36

ISSN No.:0022-3727

Key Words:GAS; MECHANISMS; NF3; SURFACE

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