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A study on etching properties of quartz and silicon by a dual-frequency (60 MHz/400 kHz) capacitively coupled NF3/Ar/O2 plasma: effect of pressure

Release Time:2025-11-26  Hits:

Date of Publication: 2025-10-24

Journal: JOURNAL OF PHYSICS D-APPLIED PHYSICS

Volume: 58

Issue: 36

ISSN: 0022-3727

Key Words: GAS; MECHANISMS; NF3; SURFACE

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