Current position: Home >> Scientific Research >> Paper Publications

Barrierless Cu-Ni-Mo Interconnect Films with High Thermal

Release Time:2019-03-13  Hits:

Indexed by: Journal Article

Date of Publication: 2012-01-01

Journal: Journal of ELECTRONIC MATERIALS

Volume: 41

Issue: 12

Page Number: 3447-3452

Prev One:Barrierless Cu-Ni-Mo Interconnect Films with High Thermal Stability Against Silicide Formation

Next One:beta-Fe3Si8M ternary alloy thin films prepared by magnetron sputtering