location： Current position: Home >> Scientific Research >> Paper Publications

Barrierless Cu–Ni–Nb thin films on silicon with high thermal

Hits:

Indexed by:期刊论文

Date of Publication:2013-01-01

Journal:J. Mater. Res.

Volume:28

Issue:24

Page Number:3367-3373

Pre One:Barrierless Cu-Ni-Nb thin films on silicon with high thermal stability and low electrical resistivity

Next One:Barrierless Cu-Ni-Mo Interconnect Films with High Thermal Stability Against Silicide Formation
Recommended Ph.D.Supervisor Recommended MA Supervisor Institutional Repository Personal Page

Address: No.2 Linggong Road, Ganjingzi District, Dalian City, Liaoning Province, P.R.C., 116024

Click : times
  • MOBILE Version
    •
    Open time:..
    The Last Update Time:..

    Mobile phone sweep