Hits:
Indexed by:期刊论文
Date of Publication:2018-01-01
Journal:JOURNAL OF PHYSICS D-APPLIED PHYSICS
Included Journals:SCIE、EI
Volume:51
Issue:13
Page Number:135304-
Pre One:Effects of adding elements M (M = C, B, Mn, Al and Al plus Co) on stability of amorphous semiconducting Fe-Si films
Next One:脉冲电流对再制造毛坯裂纹尖端组织及性能的影响