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巯基硅烷改性Nafion膜在DMFC中应用的研究

Release Time:2019-03-11  Hits:

Indexed by: Conference Paper

Date of Publication: 2005-01-01

Key Words: 巯基硅烷改性 Nafion膜 复合膜

Abstract: 采用直接浇铸的方法制备了厚度为125 微米,硅含量5﹪的Nafion/TEOS,Nafion/SCA-902, Nafion/SCA-902/TEOS 复合膜,考察不同硅烷对膜电池性能的影响,初步实验结果表明带有巯基的硅烷与Nafion.膜可以较好的结合,从而制备出巯基硅烷掺杂复合膜。Nafion/SCA-902/TEOS(TEOS:SCA-902=1:1)复合膜由于含有可以转化为磺酸根的巯基,相同硅含量的条件下,该复合膜电导率大,同时由于含有憎水的烃基,阻醇能力也要比Nafion/TEOS 复合膜好。

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