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个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 国际磨粒技术学会（International Committee of Abrasive Technology, ICAT）委员，中国机械工程学会极端制造分会副主任、生产工程分会常务委员、微纳米制造技术分会常务委员，中国机械工程学会生产工程分会磨粒加工技术专业委员会副主任、切削加工专业委员会常委委员、精密工程与微纳技术专业委员会常委委员，中国机械工程学会特种加工分会超声加工技术委员会副主任，中国机械工程学会摩擦学分会微纳制造摩擦学专业委员会常务委员，中国机械工业金属切削刀具协会切削先进制造技术研究会常务理事、对外学术交流工作委员会副主任、切削先进制造技术研究会自动化加工技术与系统委员会副主任。
性别：男
毕业院校：西北工业大学
学位：博士
所在单位：机械工程学院
学科：机械制造及其自动化. 机械电子工程. 航空宇航制造工程
办公地点：机械工程学院7191
电子邮箱：kangrk@dlut.edu.cn
Sub-nanoscale polishing of single crystal diamond(100) and the chemical behavior of nanoparticles during the polishing process
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论文类型：期刊论文
发表时间：2019-12-01
发表刊物：DIAMOND AND RELATED MATERIALS
收录刊物：EI、SCIE
卷号：100
ISSN号：0925-9635
关键字：Diamond; CMP; ReaxFF; Fenton: Nanoscale
摘要：Single crystal diamond is widely utilized in various high-tech fields due to its many excellent properties, but poor surface quality will affect its applications. Therefore, increased ability to process high-quality diamond will dramatically expand its applications in high-tech fields. A combination of mechanical grinding and chemical mechanical polishing was utilized to propose a new room-temperature polishing method, by means of abrasive particles and transition metal ions. This process activated the diamond surface and resulted in an ultra-smooth surface of Ra 0.452 tun and rms 0.572 nm (measurement area: 283 mu m x 212 mu m), as well as a monoatomic surface layer of Ra 0.115 nm and rms 0.145 tun in a local region (measurement area: 500 nm x 500 nm). The chemical behavior of nanoparticles during the polishing process was studies via reactive force field molecular dynamics simulation. The surface chemical behaviors of both abrasive particles and diamond substrate during the polishing process were elucidated by combining experiments with simulations and the diamond removal mechanism and activated mechanism of Fe2+ were explored. This work provides a theoretical basis and technical support for the ultra-precision machining of single crystal diamond.