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个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 国际磨粒技术学会（International Committee of Abrasive Technology, ICAT）委员，中国机械工程学会极端制造分会副主任、生产工程分会常务委员、微纳米制造技术分会常务委员，中国机械工程学会生产工程分会磨粒加工技术专业委员会副主任、切削加工专业委员会常委委员、精密工程与微纳技术专业委员会常委委员，中国机械工程学会特种加工分会超声加工技术委员会副主任，中国机械工程学会摩擦学分会微纳制造摩擦学专业委员会常务委员，中国机械工业金属切削刀具协会切削先进制造技术研究会常务理事、对外学术交流工作委员会副主任、切削先进制造技术研究会自动化加工技术与系统委员会副主任。
性别：男
毕业院校：西北工业大学
学位：博士
所在单位：机械工程学院
学科：机械制造及其自动化. 机械电子工程. 航空宇航制造工程
办公地点：机械工程学院7191
电子邮箱：kangrk@dlut.edu.cn
Effects of kinematic forms on material removal rate and non-uniformity in chemical mechanical planarisation
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论文类型：期刊论文
发表时间：2008-01-01
发表刊物：INTERNATIONAL JOURNAL OF MATERIALS & PRODUCT TECHNOLOGY
收录刊物：SCIE、EI
卷号：31
期号：1
页面范围：54-62
ISSN号：0268-1900
关键字：chemical mechanical planarisation; kinematic forms; material removal rate; non-uniformity; numerical calculation
摘要：Chemical Mechanical Polishing (CMP) machine is the main equipment for ultra-precise plane polishing. Based on the Preston equation, the effects of the kinematic form of the carrier and the variables on the material removal rate and the non-uniformity in the main three kinds of chemical mechanical polishers are analysed in this paper. The results may provide a theoretical reference for design of the CMP machine. It is shown that, the kinematic form of the carrier oscillating along the circle arc orbit has a little better uniformity and material removal rate than the other kinematic forms under the same kinematic parameters. In the same kinematic form, with the increase of the slope angle between the locus and the line between the centre of the locus and the centre of the pad, the material removal rates increase and the non-uniformities decrease in the reciprocation mode and the oscillation mode. When the speed of the carrier equals the speed of the pad, the material removal rate and the uniformity is the best.