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Indexed by:期刊论文

Date of Publication:2019-05-20

Journal:APPLIED OPTICS

Included Journals:EI、SCIE

Volume:58

Issue:15

Page Number:4139-4142

ISSN No.:1559-128X

Key Words:Cost effectiveness; Fabrication; Silica; Silicon; Silicon oxides; Substrates; Thermal evaporation, Cost effective; Extinction ratios; Midinfrared; Nanoimprint process; Si substrates; Silicon substrates; Transverse magnetic, Nanoimprint lithography

Abstract:We fabricated a cost-effective mid-IR micropolarizer on a common Si substrate. To improve the transmittance of Si, we performed a double oxidation on the silicon substrate. The SiO2-Si-SiO2 structure improved the transmittance of Si from 54% to 63%-83%. Then, the mid-IR micropolarizer with multidirectional gratings was fabricated using a soft nanoimprint process followed by the thermal evaporation of Al. Experimental measurements showed a transverse magnetic transmittance in the range of 61%-80% at wavelengths of 4-5 mu m, and the extinction ratio was greater than 19 dB. (C) 2019 Optical Society of America