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Cost-effective mid-infrared micropolarizer fabricated on common silicon by soft nanoimprint lithography

Release Time:2019-07-01  Hits:

Indexed by: Journal Article

Date of Publication: 2019-05-20

Journal: APPLIED OPTICS

Included Journals: SCIE、EI

Volume: 58

Issue: 15

Page Number: 4139-4142

ISSN: 1559-128X

Key Words: Cost effectiveness; Fabrication; Silica; Silicon; Silicon oxides; Substrates; Thermal evaporation, Cost effective; Extinction ratios; Midinfrared; Nanoimprint process; Si substrates; Silicon substrates; Transverse magnetic, Nanoimprint lithography

Abstract: We fabricated a cost-effective mid-IR micropolarizer on a common Si substrate. To improve the transmittance of Si, we performed a double oxidation on the silicon substrate. The SiO2-Si-SiO2 structure improved the transmittance of Si from 54% to 63%-83%. Then, the mid-IR micropolarizer with multidirectional gratings was fabricated using a soft nanoimprint process followed by the thermal evaporation of Al. Experimental measurements showed a transverse magnetic transmittance in the range of 61%-80% at wavelengths of 4-5 mu m, and the extinction ratio was greater than 19 dB. (C) 2019 Optical Society of America

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