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Indexed by:Journal Papers

Date of Publication:2019-05-01

Journal:OPTICAL ENGINEERING

Included Journals:EI、SCIE

Volume:58

Issue:5

ISSN No.:0091-3286

Key Words:near-infrared; nanowire grid polarizer array; soft nanoimprint lithography

Abstract:We fabricated a cost-effective and tractable near-infrared nanowire grid polarizer array with six different directional grating elements on a Borofloat 33 glass substrate at once using a soft nanoimprint and metal thermal evaporation process. Each element consists of a 200-nm period bilayer Al grating with an area of 1.3 x 1.3 mm(2). Scanning electron microscopy images reveal that each unit of the polarizer array has an intact nanostructure without large-area damage. Meanwhile, the TM transmittance of each element exceeds 65% in the wavelength range of 1 to 2.5 pm, and of particular note, it is >70% in the wavelength range of 1.2 to 2.5 mu m. The extinction ratio is more than 20 dB in 1.38- to 2.5 mu m wavelength range, proving that the polarizer array has good polarization characteristics. Such a polarizer array has low costs and better compatibility with microfabrication processes, which can be used as an element of near-infrared polarization image detection equipment. (C) 2019 Society of Photo-Optical Instrumentation Engineers (SPIE).