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Indexed by:期刊论文

Date of Publication:2013-07-01

Journal:JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS

Included Journals:SCIE、EI

Volume:12

Issue:3

ISSN No.:1932-5150

Key Words:nanoimprint lithography; polarization dependent; photodetector; integration

Abstract:Multioriented bilayer nanowire polarizers are integrated with photodetectors using only one-time nanoimprint lithography and metal deposition process. In order to keep the position of peak external quantum efficiency of the photodetector unchanged, the bilayer nanowire polarizer is designed to have the highest transmission at 440 nm. The photodetector is integrated with the polarizer after surface treatment. The performance of the fabricated device is then tested, and three characteristics are realized: light-intensity sensitive, polarization sensitive, and blue-light sensitive. The proposed integration method simplified the fabrication process, and the fabricated device avoids the alignment error which would be produced by using discrete elements. The results demonstrate that the proposed integration process is a promising method for fabricating photodetectors with polarization function. (C) 2013 Society of Photo-Optical Instrumentation Engineers (SPIE)