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Indexed by:期刊论文

Date of Publication:2011-10-01

Journal:MICROELECTRONIC ENGINEERING

Included Journals:Scopus、SCIE、EI

Volume:88

Issue:10

Page Number:3108-3112

ISSN No.:0167-9317

Key Words:Bilayer wire-grid polarizer; Nanoimprint lithography; Flexible plastic substrate; TM transmission; Extinction ratio

Abstract:In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. (C) 2011 Elsevier B.V. All rights reserved.