点击次数：

论文类型：期刊论文

发表时间：2015-01-01

发表刊物：MICRO & NANO LETTERS

收录刊物：SCIE、EI、Scopus

卷号：10

期号：1

页面范围：34-36

ISSN号：1750-0443

关键字：nanolithography; nanostructured materials; nanofabrication; microanalysis systems; nanoanalysis systems; sealing material; exposure time; nanotrenches; uniform nanochannel arrays; under-exposed nanoimprint; nanochannel fabrication

摘要：Uniform arrays of nanochannels were made using an underexposed nanoimprint method. The nanotrenches were bended uniformly, and the degree of the collapse was controlled by the exposure time. After deposition of the sealing material, nanochannels with a dimension of 100 nm were successfully fabricated. The blocking problem was solved by adjusting the parameters of the gratings. The proposed fabrication technique can be very helpful in micro-/nanoanalysis systems.