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冶金提纯多晶硅用坩埚内壁氮化硅涂层的制备

Release Time:2019-03-11  Hits:

Indexed by: Journal Article

Date of Publication: 2011-06-20

Journal: 机械工程材料

Included Journals: ISTIC、PKU

Issue: 06

Page Number: 8-12+75

ISSN: 1000-3738

Key Words: 太阳能电池;多晶硅;氮化硅涂层;坩埚

Abstract: 选用四种溶液与不同含量的氮化硅粉体混合得到不同的悬浊液,在石英坩埚内壁制备了氮化硅涂层,并将其用于冶金法提纯多晶硅;用扫描电镜、电子探针等分析了多晶硅铸锭与坩埚内壁的粘连面积、铸锭表面微裂纹形貌和反应层厚度,得到与最佳多晶硅铸锭脱模相对应的制备涂层的工艺参数,同时分析了熔炼过程中氮化硅涂层与硅熔体间的反应机制。结果表明:将含质量分数为8%聚乙烯吡咯烷酮的乙醇溶液和质量分数为60%氮化硅的悬浊液喷涂到坩埚内壁上,并经210℃×15min烧结后的氮化硅涂层不易分解,坩埚内壁保持完整,铸锭的脱模效果最好;随熔炼温度升高氮化硅涂层分解加剧,在涂层与硅铸锭的接触面处形成了由大颗粒氮化硅组成的连续层,减小了坩埚和涂层中杂质向硅铸锭内部扩散的可能性。

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