Hits:
First Author:Luo Yi
Disigner of the Invention:wangxiaodong,张涛,王密信
Application Number:CN201010286607.2
Authorization Date:2010-09-19
Authorization number:CN101963697A
Pre One:一种基于多层掩蔽层制作微结构的体硅加工方法
Next One:一种端面跳动与偏摆的测量装置及方法