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热丝法制备多晶硅薄膜的研究进展

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Indexed by:期刊论文

Date of Publication:2008-12-28

Journal:太阳能学报

Included Journals:Scopus、EI、PKU、ISTIC、CSCD

Volume:29

Issue:12

Page Number:1538-1545

ISSN No.:0254-0096

Key Words:热丝化学气相沉积;多晶硅;微晶硅;太阳电池;薄膜晶体管

Abstract:综述了热丝化学气相沉积法(HWCVD),制备多晶硅薄膜的发展过程,着重介绍了这种制备方法在近几年的研究进展,并展望了今后发展趋势和前景.

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