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Relationship between chemical compositions of magnetron sputtered B-C-N films and various experimental parameters

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Indexed by:期刊论文

Date of Publication:2012-04-27

Journal:VACUUM

Included Journals:SCIE、EI

Volume:86

Issue:10

Page Number:1499-1504

ISSN No.:0042-207X

Key Words:B-C-N coating; Composition; Magnetron sputtering

Abstract:By adjusting a series of experimental parameters, amorphous B-C-N films with various compositions were synthesized on silicon (100) substrate via radio frequency magnetron sputtering. The bonding characteristics and chemical compositions of B-C-N films were characterized by FTIR and XPS. On the B-C-N ternary phase diagram, the chemical compositions of most synthesized films distribute near the C-BN isoelectronic line. Among them, the low-carbon compositions can be obtained by decreasing the N-2/Ar flow ratio, increasing the power of boron and graphite targets simultaneously, or increasing the substrate temperature; those carbon-rich ones can be prepared by introducing the CH4 gas into the mixture of N-2/Ar reactive gas. Therefore, it is possible to control the compositions of B-C-N films by adjusting a set of experimental parameters. (C) 2012 Elsevier Ltd. All rights reserved.

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