Current position: Home >> Scientific Research >> Paper Publications

Relationship between chemical compositions of magnetron sputtered B-C-N films and various experimental parameters

Release Time:2019-03-09  Hits:

Indexed by: Journal Article

Date of Publication: 2012-04-27

Journal: VACUUM

Included Journals: EI、SCIE

Volume: 86

Issue: 10

Page Number: 1499-1504

ISSN: 0042-207X

Key Words: B-C-N coating; Composition; Magnetron sputtering

Abstract: By adjusting a series of experimental parameters, amorphous B-C-N films with various compositions were synthesized on silicon (100) substrate via radio frequency magnetron sputtering. The bonding characteristics and chemical compositions of B-C-N films were characterized by FTIR and XPS. On the B-C-N ternary phase diagram, the chemical compositions of most synthesized films distribute near the C-BN isoelectronic line. Among them, the low-carbon compositions can be obtained by decreasing the N-2/Ar flow ratio, increasing the power of boron and graphite targets simultaneously, or increasing the substrate temperature; those carbon-rich ones can be prepared by introducing the CH4 gas into the mixture of N-2/Ar reactive gas. Therefore, it is possible to control the compositions of B-C-N films by adjusting a set of experimental parameters. (C) 2012 Elsevier Ltd. All rights reserved.

Prev One:Synthesis and characterization of amorphous Al-Mg-B prepared by various deposition temperatures

Next One:Deposition and properties of highly c-oriented of InN films on sapphire substrates with ECR-plasma-enhanced MOCVD