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Indexed by:会议论文

Date of Publication:2007-01-01

Included Journals:CPCI-S

Volume:6722

Page Number:72209-72209

Key Words:KDP crystal; polishing; surface roughness; material removal rate; surface topography

Abstract:KDP (K-H2PO4) crystal is a high-quality nonlinear optical material used for optical frequency-conversion devices and electron-optical switches in solid-state laser drivers for ICF (Inertial Confined Fusion). KDP crystal is considered difficult to machine because it is extremely soft, hygroscopic, brittle and thermally sensitive. This paper focuses on the polishing study of frequency-tripling crystal planes. The influences of different polishing pad, slurry and machining parameters on roughness, material removal rate and surface topography have been studied. Based on above experiment, the feasibility of KDP crystal polishing was discussed.