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Indexed by:期刊论文

Date of Publication:2022-06-30

Journal:人工晶体学报

Issue:10

Page Number:2702-2707

ISSN No.:1000-985X

Abstract:Combined with the computer controlled optical surfacing (CCOS) technology, micro water dissolution polishing is a powerful method for processing large aperture KDP crystals which are water soluble. To reveal the impact of the polishing parameters on the surface roughness of the processed KDP crystal, uniform polishing experiments are carried out according to the planetary motion of the CCOS polishing tool and the feature of the water dissolution polishing process. Polishing parameters such as the tool revolution to rotation speed ratio and the rotating speed, rotation and revolution direction, polishing pressure, the diameter of the polishing tool, water content of the polishing fluid are investigated. Finally the optimal combination is acquired and a reasonable and feasible polishing process is proposed: the revolution and rotation of polishing head are in the contrast direction and the speeds are both 100 r/min; the water content of polishing liquid is 7.5wt%; large size polishing head is chosen (the dimension of polishing head ranges from one-tenth to one fifth of KDP crystal). © 2015, Chinese Ceramic Society. All right reserved.

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