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个人信息Personal Information
教授
博士生导师
硕士生导师
任职 : 精密与特种加工教育部重点实验室 副主任； 中国光整加工专业委员会 主任委员； 中国生产工程学会 常务理事； 中国国际磨粒加工技术学会（ICAT）常务理事
性别：男
毕业院校：东北工学院
学位：博士
所在单位：机械工程学院
学科：机械制造及其自动化
办公地点：机械工程学院知方楼7185室
联系方式：0411-84706138 gaohang@dlut.edu.cn
电子邮箱：gaohang@dlut.edu.cn
Effect of mechanical anisotropy on material removal rate and surface quality during polishing CdZnTe wafers
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论文类型：期刊论文
发表时间：2011-08-01
发表刊物：RARE METALS
收录刊物：SCIE、EI、CSCD
卷号：30
期号：4
页面范围：381-386
ISSN号：1001-0521
关键字：cadmium compounds; single crystals; nanoscratch tests; frictional coefficient; material removal rate; surface quality; anisotropy
摘要：The mechanical characters of CdZnTe crystal were investigated by nanoscratch tests, and the effects of mechanical anisotropy on the material removal rate and surface quality were studied by polishing tests. There is a peak of frictional coefficient at the early stage of scratch, and increasing the vertical force will result in the increase of peak value correspondingly. The fluctuation phenomenon of frictional coefficient is generated at high vertical force. The lateral forces show the apparent twofold and threefold symmetries on (110) and (111) planes, respectively. To obtain high surface quality, low polishing pressure and hard direction (<(1)over-bar10 > directions on (110) plane and < 11(2)over-bar > directions on (111) plane) should be selected, and to achieve high material removal rate, high polishing pressure and soft direction (< 001 > directions on (110) plane and <(1)over-bar2(1)over-bar > directions on (111) plane) should be selected.