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教授

博士生导师

硕士生导师

任职 : 精密与特种加工教育部重点实验室 副主任; 中国光整加工专业委员会 主任委员; 中国生产工程学会 常务理事; 中国国际磨粒加工技术学会(ICAT)常务理事

性别:男

毕业院校:东北工学院

学位:博士

所在单位:机械工程学院

学科:机械制造及其自动化

办公地点:机械工程学院知方楼7185室

联系方式:0411-84706138 gaohang@dlut.edu.cn

电子邮箱:gaohang@dlut.edu.cn

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Damage mechanisms during lapping and mechanical polishing CdZnTe wafers

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论文类型:期刊论文

发表时间:2010-06-01

发表刊物:RARE METALS

收录刊物:SCIE、EI、CSCD

卷号:29

期号:3

页面范围:276-279

ISSN号:1001-0521

关键字:lapping; mechanical polishing; wafers; surface; subsurface; abrasive

摘要:CdZnTe wafers were machined by lapping and mechanical polishing processes, and their surface and subsurface damages were investigated. The surface damages are mainly induced by three-body abrasive wear and embedded abrasive wear during lapping process. A new damage type, which is induced by the indentation of embedded abrasives, is found in the subsurface. When a floss pad is used to replace the lapping plate during machining, the surface damage is mainly induced by two-body abrasive and three-body abrasive wear, and the effect of embedded abrasives on the surface is greatly weakened. Moreover, this new damage type nearly disappears on the subsurface.