Indexed by:Journal Papers

Date of Publication:2015-09-16

Journal:JOURNAL OF PHYSICS D-APPLIED PHYSICS

Included Journals:Scopus、EI、SCIE

Volume:48

Issue:36

ISSN:0022-3727

Key Words:1D ZnO nano-arrays/rods; wet etching; etching time; end shape

Abstract:The well-aligned ZnO nano-arrays/rods synthesized by a chemical bath deposition method on a highly conductive Si substrate were chemically etched in an ammonia chloride aqueous solution. An obvious end shape modification of ZnO nano-arrays/rods was realized in this report. The hexagonal frustum end of ZnO nano-arrays/rods changed into a pyramid and the diameter of ZnO nano-arrays/rods decreased gradually with the increasing etching time. The evolution mechanism of the wet etching process was discussed based on a proposed evolution model. Photoluminescence measurements indicated that the near band edge emissions of ZnO nano-arrays/rods increased greatly after wet etching. The controllable end shape modification of ZnO nano-arrays/rods on a highly conductive Si substrate by this simple wet etching technique will further explore the application of ZnO in field emission devices and 1D based nano-devices with various end shapes.