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Title:一种带有InGaN插入层的非故意掺杂高阻GaN薄膜及其制备方法
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First Author:lianghongwei
Disigner of the Invention:刘建勋,柳阳,xiaxiaochuan,duguotong,蒋建华,闫晓密
Application Number:CN201510712168.X
Authorization Date:2015-10-28
Authorization number:CN105390532A
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