Release Time:2019-03-12 Hits:
Indexed by: Journal Article
Date of Publication: 2014-01-01
Journal: Advanced Materials Research
Volume: 912
Issue: 4
Page Number: 325-328
Prev One:Influence of Nitridation Time on the Characteristics of GaN Films Deposited on Ni Metal Substrate by ECR-MOCVD
Next One:In-Situ AlN Induced Valence State Variation of V in Vanadium Oxide Films Investigated by XPS