Current position: Home >> Scientific Research >> Paper Publications

原位AlN应力层对硅衬底上PLD法生长氧化钒薄膜性能影响研究

Release Time:2019-03-12  Hits:

Indexed by: Journal Article

Date of Publication: 2015-01-01

Journal: 材料保护

Included Journals: ISTIC、PKU

Volume: 48

Issue: 1

Page Number: 70-73

Prev One:Branched ZnO nanotrees on flexible fiber-paper substrates for self-powered energy-harvesting systems

Next One:Self-assembly of parallel aligned nanorods monolayer via thermal annealing technique