Low-temperature ECR-PEMOCVD deposition of high-quality crystalline gallium nitride films: A comparative study of intermediate layers for growth on amorphous glass substrates
Release Time:2022-10-03 Hits:
Date of Publication: 2022-10-03
Journal: MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING
Institution: 物理学院
Volume: 26
Issue: 1
Page Number: 182-186
ISSN: 1369-8001
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