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Low-temperature ECR-PEMOCVD deposition of high-quality crystalline gallium nitride films: A comparative study of intermediate layers for growth on amorphous glass substrates

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Date of Publication:2022-10-03

Journal:MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

Affiliation of Author(s):物理学院

Volume:26

Issue:1

Page Number:182-186

ISSN No.:1369-8001

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