谭毅Yi Tan

(教授)

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
电子邮箱:tanyi@dlut.edu.cn

论文成果

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Effect of electron beam injection on the removal of metal impurities in silicon

发表时间:2019-03-11 点击次数:

论文名称:Effect of electron beam injection on the removal of metal impurities in silicon
论文类型:期刊论文
发表刊物:Advanced Materials Research
收录刊物:EI、CPCI-S、Scopus
卷号:531
页面范围:55-58
ISSN号:9783037854341
关键字:Electron beam injection; Solar energy materials; Silicon; Oxidation; Metal impurities
摘要:Electron beam injection(EBI) is a process of gathering the electrons in materials using electron beam(EB). The EBI technology is proposed for purification of silicon particles by removing metal impurities through high-temperature oxidation, EBI, and HF acid washing processes. Analysis of silicon particle morphology after high-temperature oxidation using digital camera and after EBI using scanning electron microscope(SEM) were conducted. Then, the composition of silicon particles was analyzed using inductively coupled plasma(ICP). The silicon particle colours turned bright after EBI; therefore, EBI can change the thickness of SiO2 films in addition to increasing the temperature of the silicon particles. The results show that this technology is effective in removing metal impurities in silicon particles.
发表时间:2012-07-14