谭毅Yi Tan

教授

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
Email :

论文成果

当前位置: 中文主页 >> 科学研究 >> 论文成果

Boron removal from silicon by slag refining using Na2O-SiO2 in industrial applications

发布时间:2019-03-12 点击次数:

论文类型:期刊论文
发表刊物:SEPARATION SCIENCE AND TECHNOLOGY
收录刊物:SCIE
卷号:53
期号:13
页面范围:2144-2149
ISSN号:0149-6395
关键字:B removal; metallurgical-grade silicon; slag refining; thermodynamic analysis; kinetic analysis
摘要:Boron (B) removal by slag refining using Na2O-SiO2 was investigated in industrial applications. The experimental results showed that the reasonable ratio range of slag to silicon is about 0.7-0.8; the suitable holding time is about 30min; the concentration of B is reduced from 1.90 ppmw to 0.17 ppmw by three times slag refining; and the removal efficiency of B reaches 91.1%. Moreover, it is discussed that B in silicon is more inclined to be oxidized by Na2O than SiO2 according to thermodynamic analysis and then volatilized to the atmosphere in the form of Na2B2O4 according to kinetic analysis.