谭毅Yi Tan

(教授)

 博士生导师  硕士生导师
学位:博士
性别:男
毕业院校:东京工业大学
所在单位:材料科学与工程学院
电子邮箱:tanyi@dlut.edu.cn

论文成果

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Boron removal from silicon by slag refining using Na2O-SiO2 in industrial applications

发表时间:2019-03-12 点击次数:

论文名称:Boron removal from silicon by slag refining using Na2O-SiO2 in industrial applications
论文类型:期刊论文
发表刊物:SEPARATION SCIENCE AND TECHNOLOGY
收录刊物:SCIE
卷号:53
期号:13
页面范围:2144-2149
ISSN号:0149-6395
关键字:B removal; metallurgical-grade silicon; slag refining; thermodynamic analysis; kinetic analysis
摘要:Boron (B) removal by slag refining using Na2O-SiO2 was investigated in industrial applications. The experimental results showed that the reasonable ratio range of slag to silicon is about 0.7-0.8; the suitable holding time is about 30min; the concentration of B is reduced from 1.90 ppmw to 0.17 ppmw by three times slag refining; and the removal efficiency of B reaches 91.1%. Moreover, it is discussed that B in silicon is more inclined to be oxidized by Na2O than SiO2 according to thermodynamic analysis and then volatilized to the atmosphere in the form of Na2B2O4 according to kinetic analysis.
发表时间:2018-01-01